Wafer Dicing Motion System – ±0.5μm XY, ±0.2μm Z Repeatability
High‑speed direct‑drive motion system for blade & laser dicing. XY ±0.5μm, Z ±0.2μm, rotary ±2arcsec repeatability. Porous ceramic chuck, optional maglev/water‑cooled Z‑axis. Customizable for advanced packaging and thin wafer processing.
wafer dicing
blade/laser dicing
precision direct‑drive motion
semiconductor back‑end
high‑speed dicing