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Electrostatic Chuck&Controller
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Electrostatic Chuck
Electrostatic Chuck
Electrostatic Chuck
Features

  • Coulomb's Law or Gradient Force electrostatic chuck  
  • Support Bi-polar, multi-polar electrode, interdigitated electrode design etc.
  • Suitable for UHV environments up to 10-5 Pa 
  • High clamping force
  • Typical global flatness: 5μm PV (D = 300 mm)
  • Flexible surface pattern design
  • Suitable for non-magnetic environment
  • Substrates include wafer, dielectric material such as sapphire, glass and more.

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Applications
  • Wafer Metrology: EBI, CD - SEM, Review - SEM
  • Wafer Manufacturing
  • Thin Film Deposition (CVD, PVD etc.)
Description

The Electrostatic Chuck (E-Chuck) is a holding tool for substrates such as silicon wafers in semiconductor processes. Based on the principle of electrostatic adsorption, the E-Chuck fixes substrates like silicon wafers through Coulomb force or gradient force generated by the chuck after the application of an external high voltage.

 

Performance Chart

General dimension,Unit:mm

Technical Specifications
<<<Swipe left to see more parameters

 

Unit

6inch E-Chuck

8inch E-Chuck

12inch E-Chuck

Electrostatic type

 

Coulombic or Gradient

Coulombic or Gradient

Coulombic or Gradient

Electrode type

 

Bi-polar or interdigitated electrode

Accuracy

 

 

 

 

Global flatness

μm

≤3

≤3 ≤3

Parallelism

μm

<30

<30

<30

Electrical properties

 

 

 

 

Standard clamping voltage

V

1000

1000

1000

Leakage current

nA

<5

<5

<5

Performance parameter

 

 

 

 

Clamping force

N

≥8 (Coulomb)

≥12(Coulomb)

≥30(Coulomb)

Dimensions

 

 

 

 

Diameter

mm

144

194

294

Thickness

mm

12.6

12.6

12.6

*Customized requirements accepted

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