Electrostatic Chuck – UHV, Coulomb/Gradient Force, ≤3μm Flatness
Electrostatic Chuck – UHV, Coulomb/Gradient Force, ≤3μm Flatness
- Coulomb's Law or Gradient Force electrostatic chuck
- Support Bi-polar, multi-polar electrode, interdigitated electrode design etc.
- Suitable for UHV environments up to 10-5 Pa
- High clamping force
- Typical global flatness: 5μm PV (D = 300 mm)
- Flexible surface pattern design
- Suitable for non-magnetic environment
- Substrates include wafer, dielectric material such as sapphire, glass and more.
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